Method of depositing a metal film on a silyl hydride containing surface of a solid and products produced thereby
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Abstract/Description: | A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid. |
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Subject(s): | 427/299 427/383.3 427/383.5 502/253 502/439 |
Date Issued: | 1994-01-25 |
Title: | Method of depositing a metal film on a silyl hydride containing surface of a solid and products produced thereby. |
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Name(s): |
The University of Toledo, assignee Fry, James L., inventor Nadkarni, Durgesh V., inventor |
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Type of Resource: | text | |
Genre: | patent | |
Publisher: | United States Patent and Trademark Office | |
Other Date: | Date Filed: 1992-04-01 | |
Date Issued: | 1994-01-25 | |
Physical Form: | application/pdf | |
Extent: | 5 p. | |
Abstract/Description: | A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid. | |
Identifier(s): |
utpatents-US5281440 (IID) Patent No.: US5281440 (patno) Appl. No.: 07/861655 (appno) |
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Subject(s): |
427/299 427/383.3 427/383.5 502/253 502/439 |
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Held by: | United States Patent and Trademark Office (USPTO) Public Search Facility | |
Location: | University of Toledo Digital Repository | |
Rights Statement: | No Copyright - United States | |
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