Method of depositing a metal film on a silyl hydride containing surface of a solid and products produced thereby

A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid.
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Abstract/Description: A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid.
Subject(s): 427/299
427/383.3
427/383.5
502/253
502/439
Date Issued: 1994-01-25