University of Toledo U.S. Patents

This collection includes United States patents for inventions by UT faculty, students and staff that list UT/MCO/MUO as the original assignee (owner). These patents include those assigned to the University of Toledo as well as to the Medical College of Ohio/Medical University of Ohio prior to the merger in 2006. Only granted patents, not patent applications, are included. Use the 'Search within this Series' box to search for keywords in the authors, titles, or abstracts of the patents.

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Method of producing organo indium chlorides
A method for producing organo metal chlorides directly from molten metal. The organo metal chlorides are formed by contacting an organo chloride directly with a metal melt. The preferred method includes the use of indium as the metal and methyl chloride as the organo chloride. The direct contact of the methyl chloride with the indium metal results in the production of dimethyl indium chloride or methyl indium dichloride depending on the contacting time and efficiency of the process. The resulting products are suitable for use as a precursor gas for chemical vapor deposition processes. Additionally, activator compounds such as oxides or halides are optionally added to the metal melt to enhance the reaction rate.
Method of producing organo indium chlorides
A method for producing organo metal chlorides directly from molten metal. The organo metal chlorides are formed by contacting an organo chloride directly with a metal melt. The preferred method includes the use of indium as the metal and methyl chloride as the organo chloride. The direct contact of the methyl chloride with the indium metal results in the production of dimethyl indium chloride or methyl indium dichloride depending on the contacting time and efficiency of the process. The resulting products are suitable for use as a precursor gas for chemical vapor deposition processes. Additionally, activator compounds such as oxides or halides are optionally added to the metal melt to enhance the reaction rate.