Document Type

Patent

Abstract

A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid.

Patent Country

US

Patent Number

US5281440

Publication Date

1-25-1994

Assignee(s)

The University of Toledo

Application Number

07/861655

Filing Date

April 1992

Primary Class

427/299

Secondary Class

427/383.3; 427/383.5; 502/253; 502/439

Rights

These materials are free of copyright restrictions and are in the public domain within the United States only. The USPTO reserves the right to assert copyright protection internationally.

Institution

The University of Toledo

Repository

University of Toledo Libraries

Digital Publisher

Digital Initiatives

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