Abstract

A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid.

Document Type

Patent

Primary Class

427/299

Secondary Class

427/383.3; 427/383.5; 502/253; 502/439

Application Number

07/861655

Filing Date

April 1992

Patent Number

US5281440

Assignee(s)

The University of Toledo

Publication Date

1-25-1994

Patent Country

US

Language

en_US

Institution

The University of Toledo

Repository

University of Toledo Libraries

Digital Publisher

Digital Initiatives

Rights

These materials are free of copyright restrictions and are in the public domain within the United States only. The USPTO reserves the right to assert copyright protection internationally.

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Rights Statement

No Copyright - United States. URI: http://rightsstatements.org/vocab/NoC-US/1.0/
The organization that has made the Item available believes that the Item is in the Public Domain under the laws of the United States, but a determination was not made as to its copyright status under the copyright laws of other countries. The Item may not be in the Public Domain under the laws of other countries. Please refer to the organization that has made the Item available for more information.